Discrete saturation thickness and anomalous potential height of native ultrathin aluminum oxide tunnel barriers

dc.creatorGloos, K.
dc.creatorKoppinen, P. J.
dc.creatorPekola, J. P.
dc.date2001-05-26
dc.date.accessioned2026-07-25T21:52:31Z
dc.descriptionWe have investigated planar metal - insulator - metal tunnel junctions with aluminum oxide as dielectricum. These oxide barriers were grown on an aluminum electrode in pure oxygen at room temperature till saturation. We observed discrete barrier widths separated by Δs \approx 0.38 nm, corresponding to the addition of one layer of oxygen atoms. The minimum thickness of s_0 \approx 0.54 nm is due to a double layer of oxygen. We found a strong and systematic dependence of the barrier height Φ_0 on the thickness s like Φ_0 \approx 2.5 eV / s^2(nm), which nearly coincides with the kinetic electron energy E = h^2/2ms^2 for which the deBroglie wavelength matches the width of the barrier.
dc.description4 pages, 4 eps figures
dc.identifierhttps://arxiv.org/abs/cond-mat/0105511
dc.identifierhttp://arxiv.org/abs/cond-mat/0105511
dc.identifier.urihttps://dspace.dare.co.zw/handle/123456789/83729
dc.subjectMesoscale and Nanoscale Physics
dc.titleDiscrete saturation thickness and anomalous potential height of native ultrathin aluminum oxide tunnel barriers
dc.typetext

Files